Course detail
Preparation and Properties of Thin Layers of Materials
FCH-DA_PTVAcad. year: 2025/2026
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).
Language of instruction
English
Mode of study
Not applicable.
Guarantor
Department
Entry knowledge
Not applicable.
Aims
Not applicable.
Study aids
Not applicable.
Prerequisites and corequisites
Not applicable.
Basic literature
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)
Recommended reading
Not applicable.
Classification of course in study plans
- Programme DPAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional
- Programme DKAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional