Course detail
Preparation and properties of thin layers of materials
FCH-DCO_PTVAcad. year: 2024/2025
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Language of instruction
Czech
Mode of study
Not applicable.
Guarantor
Department
Entry knowledge
An introduction to thin films.
Rules for evaluation and completion of the course
Entrance written test and oral exam.
Optional attendance at lectures.
Optional attendance at lectures.
Aims
Advanced technologies and analyses of thin films are the aims of this subject.
Students will acquire knowledge of thin films necessary for their dissertation.
Students will acquire knowledge of thin films necessary for their dissertation.
Study aids
Not applicable.
Prerequisites and corequisites
Not applicable.
Basic literature
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
Recommended reading
Not applicable.
Classification of course in study plans
- Programme DKCP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional
- Programme DPCP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional