Course detail
Thin Films
FCH-MCO_TVRAcad. year: 2022/2023
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
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Learning outcomes of the course unit
Prerequisites
Co-requisites
Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
2. Fundamentals of vacuum science
3. Introduction to plasma physics and chemistry
4. Physical vapor deposition
5. Chemical vapor deposition
6. Plasma-enhanced chemical vapor deposition
7. Film growth
8. Film thickness measurement
9. Scanning probe microscopy
10. Mechanical properties
11. Case study
12. Case study
13. Written test, visit to laboratories
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
Recommended optional programme components
Prerequisites and corequisites
Basic literature
Eckertová L.: Fyzika tenkých vrstev. SNTL, Praha 1973. (CS)
Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998. (CS)
M. Ohring, The Materials Science of Thin Films, Academic Press 2001 (CS)
Mironov V. L.: Fundamentals of Scanning Probe Microscopy. Tekhnosfera, Moscow 2004. (CS)
N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic 1996 (CS)
Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002. (CS)
Recommended reading
Classification of course in study plans
Type of course unit
Guided consultation in combined form of studies
Teacher / Lecturer