Course detail
Thin Films
FCH-MC_TVRAcad. year: 2021/2022
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
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Learning outcomes of the course unit
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Co-requisites
Planned learning activities and teaching methods
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Course curriculum
2. Fundamentals of vacuum science
3. Introduction to plasma physics and chemistry
4. Physical vapor deposition
5. Chemical vapor deposition
6. Plasma-enhanced chemical vapor deposition
7. Film growth
8. Film thickness measurement
9. Scanning probe microscopy
10. Mechanical properties
11. Case study
12. Case study
13. Written test, visit to laboratories
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
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Prerequisites and corequisites
Basic literature
L. Eckertová, Fyzika tenkých vrstev, SNTL 1973 (CS)
M. Ohring, Materials Science of Thin Films, Academic Press 2002 (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004 (CS)
Recommended reading
Classification of course in study plans
Type of course unit
Guided consultation in combined form of studies
Teacher / Lecturer