Course detail
Thin Films
FCH-MAO_TVRAcad. year: 2012/2013
The structure of the lecture includes a definition of basic terms; introduction to vacuum science, plasma physics, and plasma chemistry; vacuum and plasma technologies for thin film deposition: vacuum evaporation, sputtering, plasma polymerization, the use of lasers for thin film deposition, chemical vapor deposition; characterization of thin films: film growth, determination of film thickness, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measuring techniques, tension, adhesion).
Language of instruction
Number of ECTS credits
Mode of study
Guarantor
Department
Learning outcomes of the course unit
Prerequisites
Co-requisites
Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
Vacuum science
Plasma physics and plasma chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma polymerization
Film growth
Thin film characterization
Scanning probe microscopy
Machanical properties of thin films
Laboratory visit
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
Recommended optional programme components
Prerequisites and corequisites
Basic literature
M. Ohring, The Materials Science of Thin Films, Academic Press 2001 (EN)
N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic 1996 (EN)
Recommended reading
Classification of course in study plans