Publication detail

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

ČECH, V.

Original Title

Type

lecture

Language

English

Original Abstract

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Keywords

thin films, PECVD

Authors

ČECH, V.

Released

26. 7. 2012

Location

Tatung University, Taipei, Taiwan

BibTex

@misc{BUT97298,
  author="Vladimír {Čech}",
  title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys",
  year="2012",
  address="Tatung University, Taipei, Taiwan",
  note="lecture"
}