Detail publikace

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

ČECH, V.

Originální název

Typ

přednáška

Jazyk

angličtina

Originální abstrakt

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Klíčová slova

thin films, PECVD

Autoři

ČECH, V.

Vydáno

26. 7. 2012

Místo

Tatung University, Taipei, Taiwan

BibTex

@misc{BUT97298,
  author="Vladimír {Čech}",
  title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys",
  year="2012",
  address="Tatung University, Taipei, Taiwan",
  note="lecture"
}