Publication detail
Protection by Deposition of Parylene and SiOx Thin Films
BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.
Original Title
Protection by Deposition of Parylene and SiOx Thin Films
Type
conference paper
Language
English
Original Abstract
This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).
Keywords
thin protective film, parylene layers
Authors
BALAŠTÍKOVÁ, R.; PROCHÁZKA, M.; MENČÍK, P.; HORÁK, J.; PŘIKRYL, R.; KRČMA, F.
RIV year
2012
Released
15. 10. 2012
Location
Brno
ISBN
978-80-210-5979-5
Book
Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts
Pages from
32
Pages to
34
Pages count
3
BibTex
@inproceedings{BUT96892,
author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
title="Protection by Deposition of Parylene and SiOx Thin Films",
booktitle="Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts",
year="2012",
pages="32--34",
address="Brno",
isbn="978-80-210-5979-5"
}