Detail publikace
Protection by Deposition of Parylene and SiOx Thin Films
BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.
Originální název
Protection by Deposition of Parylene and SiOx Thin Films
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).
Klíčová slova
thin protective film, parylene layers
Autoři
BALAŠTÍKOVÁ, R.; PROCHÁZKA, M.; MENČÍK, P.; HORÁK, J.; PŘIKRYL, R.; KRČMA, F.
Rok RIV
2012
Vydáno
15. 10. 2012
Místo
Brno
ISBN
978-80-210-5979-5
Kniha
Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts
Strany od
32
Strany do
34
Strany počet
3
BibTex
@inproceedings{BUT96892,
author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
title="Protection by Deposition of Parylene and SiOx Thin Films",
booktitle="Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts",
year="2012",
pages="32--34",
address="Brno",
isbn="978-80-210-5979-5"
}