Publication detail
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.
Original Title
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
Type
conference paper
Language
English
Original Abstract
Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
Keywords
PECVD, HMDSO, thin layers, barriere properties
Authors
PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.
RIV year
2012
Released
10. 7. 2012
Publisher
EPS
Location
Lisbon
ISBN
2-914771-74-6
Book
Europhysics Conference Abstracts
Edition number
36A
Pages from
P3.5.71
Pages to
P3.5.72
Pages count
2