Detail publikace
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.
Originální název
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
Klíčová slova
PECVD, HMDSO, thin layers, barriere properties
Autoři
PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.
Rok RIV
2012
Vydáno
10. 7. 2012
Nakladatel
EPS
Místo
Lisbon
ISBN
2-914771-74-6
Kniha
Europhysics Conference Abstracts
Číslo edice
36A
Strany od
P3.5.71
Strany do
P3.5.72
Strany počet
2