Publication detail
Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
BÁBOR, P. MAŠEK, K.
Original Title
Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
English Title
Methods of surface and thin film analysisof chemical composition, photoelectron diffraction
Type
journal article - other
Language
Czech
Original Abstract
The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.
English abstract
The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.
Keywords
XPS, AES, SIMS, fotoelektronová difrakce
Key words in English
XPS, AES, SIMS, photoelectron spectroscopy
Authors
BÁBOR, P.; MAŠEK, K.
RIV year
2011
Released
1. 12. 2011
ISBN
1211-5894
Periodical
Materials Structure
Year of study
2011
Number
18
State
Czech Republic
Pages from
251
Pages to
257
Pages count
7
BibTex
@article{BUT89985,
author="Petr {Bábor} and Karel {Mašek}",
title="Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.",
journal="Materials Structure",
year="2011",
volume="2011",
number="18",
pages="251--257",
issn="1211-5894"
}