Detail publikace
Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
BÁBOR, P. MAŠEK, K.
Originální název
Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
Anglický název
Methods of surface and thin film analysisof chemical composition, photoelectron diffraction
Typ
článek v časopise - ostatní, Jost
Jazyk
čeština
Originální abstrakt
The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.
Anglický abstrakt
The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.
Klíčová slova
XPS, AES, SIMS, fotoelektronová difrakce
Klíčová slova v angličtině
XPS, AES, SIMS, photoelectron spectroscopy
Autoři
BÁBOR, P.; MAŠEK, K.
Rok RIV
2011
Vydáno
1. 12. 2011
ISSN
1211-5894
Periodikum
Materials Structure
Ročník
2011
Číslo
18
Stát
Česká republika
Strany od
251
Strany do
257
Strany počet
7
BibTex
@article{BUT89985,
author="Petr {Bábor} and Karel {Mašek}",
title="Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.",
journal="Materials Structure",
year="2011",
volume="2011",
number="18",
pages="251--257",
issn="1211-5894"
}