Publication detail

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Type

conference paper

Language

English

Original Abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Keywords

Plasma deposition, optical emission spectroscopy, organosilicones

Authors

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

RIV year

2003

Released

15. 11. 2003

Publisher

MATFYZPRESS

Location

Praha

ISBN

80-86732-18-5

Book

Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003

Edition number

Pages from

441

Pages to

445

Pages count

BibTex

@inproceedings{BUT8852,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films",
  booktitle="Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003",
  year="2003",
  number="1",
  pages="5",
  publisher="MATFYZPRESS",
  address="Praha",
  isbn="80-86732-18-5"
}