Detail publikace

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Klíčová slova

Plasma deposition, optical emission spectroscopy, organosilicones

Autoři

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Rok RIV

2003

Vydáno

15. 11. 2003

Nakladatel

MATFYZPRESS

Místo

Praha

ISBN

80-86732-18-5

Kniha

Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003

Číslo edice

Strany od

441

Strany do

445

Strany počet

BibTex

@inproceedings{BUT8852,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films",
  booktitle="Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003",
  year="2003",
  number="1",
  pages="5",
  publisher="MATFYZPRESS",
  address="Praha",
  isbn="80-86732-18-5"
}