Publication detail

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Type

conference paper

Language

English

Original Abstract

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Keywords

Plasma deposition, organosilikone layers, optical emission spectroscopy

Authors

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

RIV year

2003

Released

15. 1. 2003

Publisher

Slovenská akadémia ved

Location

Bratislava

ISBN

80-8040-195-0

Book

Proceedings of 14th Symposium on Application of Plasma Processes

Edition number

Pages from

222

Pages to

223

Pages count

BibTex

@inproceedings{BUT8823,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films",
  booktitle="Proceedings of 14th Symposium on Application of Plasma Processes",
  year="2003",
  number="1",
  pages="2",
  publisher="Slovenská akadémia ved",
  address="Bratislava",
  isbn="80-8040-195-0"
}