Detail publikace

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Klíčová slova

Plasma deposition, organosilikone layers, optical emission spectroscopy

Autoři

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Rok RIV

2003

Vydáno

15. 1. 2003

Nakladatel

Slovenská akadémia ved

Místo

Bratislava

ISBN

80-8040-195-0

Kniha

Proceedings of 14th Symposium on Application of Plasma Processes

Číslo edice

Strany od

222

Strany do

223

Strany počet

BibTex

@inproceedings{BUT8823,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films",
  booktitle="Proceedings of 14th Symposium on Application of Plasma Processes",
  year="2003",
  number="1",
  pages="2",
  publisher="Slovenská akadémia ved",
  address="Bratislava",
  isbn="80-8040-195-0"
}