Publication detail

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

OTTAVIANO, L. BUSSOLOTTI, F. PIPERNO, S. RINALDI, M. SANTUCCI, S. FLORA, F. MEZI, L. DUNNE, P. KAISER, J. REALE, A. RITUCCI, A., ZUPPELA, P.

Original Title

Type

journal article - other

Language

English

Original Abstract

An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.

Keywords

soft X-ray laser, interferometric litography, metallic micropatterns

Authors

OTTAVIANO, L.; BUSSOLOTTI, F.; PIPERNO, S.; RINALDI, M.; SANTUCCI, S.; FLORA, F.; MEZI, L.; DUNNE, P.; KAISER, J.; REALE, A.; RITUCCI, A., ZUPPELA, P.

RIV year

2008

Released

1. 5. 2008

ISBN

0963-0252

Periodical

PLASMA SOURCES SCIENCE & TECHNOLOGY

Year of study

Number

State

United Kingdom of Great Britain and Northern Ireland

Pages from

24019

Pages to

24023

Pages count

BibTex

@article{BUT48119,
  author="OTTAVIANO, L. and BUSSOLOTTI, F. and PIPERNO, S. and RINALDI, M. and SANTUCCI, S. and FLORA, F. and MEZI, L. and DUNNE, P. and KAISER, J. and REALE, A. and RITUCCI, A., ZUPPELA, P.",
  title="Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography",
  journal="PLASMA SOURCES SCIENCE & TECHNOLOGY",
  year="2008",
  volume="17",
  number="2",
  pages="24019--24023",
  issn="0963-0252"
}