Detail publikace

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography

OTTAVIANO, L. BUSSOLOTTI, F. PIPERNO, S. RINALDI, M. SANTUCCI, S. FLORA, F. MEZI, L. DUNNE, P. KAISER, J. REALE, A. RITUCCI, A., ZUPPELA, P.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.

Klíčová slova

soft X-ray laser, interferometric litography, metallic micropatterns

Autoři

OTTAVIANO, L.; BUSSOLOTTI, F.; PIPERNO, S.; RINALDI, M.; SANTUCCI, S.; FLORA, F.; MEZI, L.; DUNNE, P.; KAISER, J.; REALE, A.; RITUCCI, A., ZUPPELA, P.

Rok RIV

2008

Vydáno

1. 5. 2008

ISSN

0963-0252

Periodikum

PLASMA SOURCES SCIENCE & TECHNOLOGY

Ročník

Číslo

Stát

Spojené království Velké Británie a Severního Irska

Strany od

24019

Strany do

24023

Strany počet

BibTex

@article{BUT48119,
  author="OTTAVIANO, L. and BUSSOLOTTI, F. and PIPERNO, S. and RINALDI, M. and SANTUCCI, S. and FLORA, F. and MEZI, L. and DUNNE, P. and KAISER, J. and REALE, A. and RITUCCI, A., ZUPPELA, P.",
  title="Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography",
  journal="PLASMA SOURCES SCIENCE & TECHNOLOGY",
  year="2008",
  volume="17",
  number="2",
  pages="24019--24023",
  issn="0963-0252"
}