Publication detail

Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

ČECH, V. STUDÝNKA, J. JANOŠ, F. PEŘINA, V.

Original Title

Type

journal article - other

Language

English

Original Abstract

Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen.

Keywords

Glow discharge mass spectroscopy (GDMS); Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD; Plasma polymer

Authors

ČECH, V.; STUDÝNKA, J.; JANOŠ, F.; PEŘINA, V.

RIV year

2007

Released

13. 12. 2007

ISBN

1612-8850

Periodical

Plasma Processes and Polymers

Year of study

Number

State

Federal Republic of Germany

Pages from

776

Pages to

780

Pages count

BibTex

@article{BUT45130,
  author="Vladimír {Čech} and Jan {Studýnka} and Filip {Janoš} and Vratislav {Peřina}",
  title="Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas",
  journal="Plasma Processes and Polymers",
  year="2007",
  volume="4",
  number="S1",
  pages="776--780",
  issn="1612-8850"
}