Detail publikace

Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

ČECH, V. STUDÝNKA, J. JANOŠ, F. PEŘINA, V.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen.

Klíčová slova

Glow discharge mass spectroscopy (GDMS); Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD; Plasma polymer

Autoři

ČECH, V.; STUDÝNKA, J.; JANOŠ, F.; PEŘINA, V.

Rok RIV

2007

Vydáno

13. 12. 2007

ISSN

1612-8850

Periodikum

Plasma Processes and Polymers

Ročník

Číslo

Stát

Spolková republika Německo

Strany od

776

Strany do

780

Strany počet

BibTex

@article{BUT45130,
  author="Vladimír {Čech} and Jan {Studýnka} and Filip {Janoš} and Vratislav {Peřina}",
  title="Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas",
  journal="Plasma Processes and Polymers",
  year="2007",
  volume="4",
  number="S1",
  pages="776--780",
  issn="1612-8850"
}