Publication detail

Physico-chemical properties of plasma-polymerized tetravinylsilane

ČECH, V. STUDÝNKA, J. CONTE, N. PEŘINA, V.

Original Title

Type

journal article - other

Language

English

Original Abstract

Plasma polymer films of tetravinylsilane were deposited on silicon wafers using an RF glow discharge operated in pulsed mode. Microscopic and spectroscopic techniques revealed that physico-chemical properties of plasma polymer depend on the effective power used if the flow rate was constant. The deposition rate (8 - 165 nm min-1) and surface roughness (2.0 - 5.8 nm) of films varied with the RF power. An organic/inorganic character (C/Si ratio) of films and a content of vinyl groups could be controlled by the effective power. The refractive index of films increased with power from 1.63 (0.05 W) to 1.75 (10 W) at a wavelength of 633 nm and the extinction coefficient rose sharply with the power from 0.09 (0.05 W) to 0.37 (10 W) at a wavelength of 240 nm. The elastic modulus and hardness of plasma polymer could be varied from 11 GPa (0.05 W) to 30 GPa (10 W) and from 1.4 to 5.9 GPa, respectively.

Keywords

Nano-indentation; Atomic force microscopy (AFM); Ellipsometry; Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD

Authors

ČECH, V.; STUDÝNKA, J.; CONTE, N.; PEŘINA, V.

RIV year

2007

Released

13. 12. 2007

Publisher

Elsevier

ISBN

0257-8972

Periodical

Surface and Coatings Technology

Year of study

201

Number

State

Swiss Confederation

Pages from

5512

Pages to

5517

Pages count

BibTex

@article{BUT45125,
  author="Vladimír {Čech} and Jan {Studýnka} and Nicolas {Conte} and Vratislav {Peřina}",
  title="Physico-chemical properties of plasma-polymerized tetravinylsilane",
  journal="Surface and Coatings Technology",
  year="2007",
  volume="201",
  number="10",
  pages="5512--5517",
  issn="0257-8972"
}