Detail publikace

Physico-chemical properties of plasma-polymerized tetravinylsilane

ČECH, V. STUDÝNKA, J. CONTE, N. PEŘINA, V.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Plasma polymer films of tetravinylsilane were deposited on silicon wafers using an RF glow discharge operated in pulsed mode. Microscopic and spectroscopic techniques revealed that physico-chemical properties of plasma polymer depend on the effective power used if the flow rate was constant. The deposition rate (8 - 165 nm min-1) and surface roughness (2.0 - 5.8 nm) of films varied with the RF power. An organic/inorganic character (C/Si ratio) of films and a content of vinyl groups could be controlled by the effective power. The refractive index of films increased with power from 1.63 (0.05 W) to 1.75 (10 W) at a wavelength of 633 nm and the extinction coefficient rose sharply with the power from 0.09 (0.05 W) to 0.37 (10 W) at a wavelength of 240 nm. The elastic modulus and hardness of plasma polymer could be varied from 11 GPa (0.05 W) to 30 GPa (10 W) and from 1.4 to 5.9 GPa, respectively.

Klíčová slova

Nano-indentation; Atomic force microscopy (AFM); Ellipsometry; Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD

Autoři

ČECH, V.; STUDÝNKA, J.; CONTE, N.; PEŘINA, V.

Rok RIV

2007

Vydáno

13. 12. 2007

Nakladatel

Elsevier

ISSN

0257-8972

Periodikum

Surface and Coatings Technology

Ročník

201

Číslo

Stát

Švýcarská konfederace

Strany od

5512

Strany do

5517

Strany počet

BibTex

@article{BUT45125,
  author="Vladimír {Čech} and Jan {Studýnka} and Nicolas {Conte} and Vratislav {Peřina}",
  title="Physico-chemical properties of plasma-polymerized tetravinylsilane",
  journal="Surface and Coatings Technology",
  year="2007",
  volume="201",
  number="10",
  pages="5512--5517",
  issn="0257-8972"
}