Publication detail

Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure

ČECH, V. VANĚK, J. DRZAL, L.

Original Title

Type

journal article - other

Language

English

Original Abstract

Plasma polymer films of vinyltriethoxysilane were prepared at the same deposition conditions but different film thicknesses and analyzed with respect to deposition rate, surface morphology and selected mechanical properties. The mean deposition rate decreased from 190 to 105 nm min-1 and the RMS roughness increased from 0.1 to 17.5 nm with film thickness ranging from 15.8 nm to 8.4 _m. The RMS roughness correlated to film thickness and the roughening coefficient was 0.92. Depth profiles of the elastic modulus and hardness revealed the gradient character of the films with thickness of up to 0.5 _m and a layered structure of a thicker film. Results enabled the reconstruction of a thicker film (> 0.5 _m) as the layered structure, which consists of a gradient interlayer at the substrate, a relatively homogeneous layer as the bulk, and gradient overlayer at the film surface.

Keywords

PE CVD, vinyltriethoxysilane, a-SiOC:H, nanoindentation, continuous stiffness measurement, AFM, RMS roughness, Young's modulus, hardness

Authors

ČECH, V.; VANĚK, J.; DRZAL, L.

RIV year

2006

Released

5. 12. 2006

ISBN

0021-4922

Periodical

Japanese Journal of Applied Physics

Year of study

Number

10B

State

Japan

Pages from

8440

Pages to

8444

Pages count

BibTex

@article{BUT43627,
  author="Vladimír {Čech} and Jan {Vaněk} and Lawrence {Drzal}",
  title="Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure",
  journal="Japanese Journal of Applied Physics",
  year="2006",
  volume="45",
  number="10B",
  pages="8440--8444",
  issn="0021-4922"
}