Publication detail

Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane

ČECH, V. INAGAKI, N. VANĚK, J. PŘIKRYL, R. GRYCOVÁ, A. ZEMEK, J.

Original Title

Type

journal article - other

Language

English

Original Abstract

Plasma-polymerized and polycondensed thin films of vinyltriethoxysilane were deposited on planar glass substrates and glass fibers using plasma-enhanced chemical vapor deposition and a wet chemical process. Deposited films were extensively characterized by microscopic and spectroscopic techniques and indentation tests in order to compare their elemental composition, chemical structure, wettability, elastic modulus, hardness, and adhesion. The physicochemical properties of the polycondensed films were invariable, while those of the plasma-polymerized films could be varied in relatively wide ranges by altering the deposition conditions.

Keywords

Chemical vapor deposition; Plasma processing and deposition; Organosilicon

Authors

ČECH, V.; INAGAKI, N.; VANĚK, J.; PŘIKRYL, R.; GRYCOVÁ, A.; ZEMEK, J.

RIV year

2006

Released

27. 11. 2006

ISBN

0040-6090

Periodical

Thin Solid Films

Year of study

502

Number

State

Kingdom of the Netherlands

Pages from

181

Pages to

187

Pages count

BibTex

@article{BUT43591,
  author="Vladimír {Čech} and Norihiro {Inagaki} and Jan {Vaněk} and Radek {Přikryl} and Alena {Grycová} and Josef {Zemek}",
  title="Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane",
  journal="Thin Solid Films",
  year="2006",
  volume="502",
  number="1",
  pages="181--187",
  issn="0040-6090"
}