Detail publikace

Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane

ČECH, V. INAGAKI, N. VANĚK, J. PŘIKRYL, R. GRYCOVÁ, A. ZEMEK, J.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Plasma-polymerized and polycondensed thin films of vinyltriethoxysilane were deposited on planar glass substrates and glass fibers using plasma-enhanced chemical vapor deposition and a wet chemical process. Deposited films were extensively characterized by microscopic and spectroscopic techniques and indentation tests in order to compare their elemental composition, chemical structure, wettability, elastic modulus, hardness, and adhesion. The physicochemical properties of the polycondensed films were invariable, while those of the plasma-polymerized films could be varied in relatively wide ranges by altering the deposition conditions.

Klíčová slova

Chemical vapor deposition; Plasma processing and deposition; Organosilicon

Autoři

ČECH, V.; INAGAKI, N.; VANĚK, J.; PŘIKRYL, R.; GRYCOVÁ, A.; ZEMEK, J.

Rok RIV

2006

Vydáno

27. 11. 2006

ISSN

0040-6090

Periodikum

Thin Solid Films

Ročník

502

Číslo

Stát

Nizozemsko

Strany od

181

Strany do

187

Strany počet

BibTex

@article{BUT43591,
  author="Vladimír {Čech} and Norihiro {Inagaki} and Jan {Vaněk} and Radek {Přikryl} and Alena {Grycová} and Josef {Zemek}",
  title="Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane",
  journal="Thin Solid Films",
  year="2006",
  volume="502",
  number="1",
  pages="181--187",
  issn="0040-6090"
}