Publication detail
Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor
PROCHÁZKA, M. KRČMA, F. PŘIKRYL, R.
Original Title
Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor
Type
conference paper
Language
English
Original Abstract
The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.
Keywords
Optical emission spectroscopy, organosilicons, thin film deposition, plasma diagnostics
Authors
PROCHÁZKA, M.; KRČMA, F.; PŘIKRYL, R.
RIV year
2011
Released
14. 1. 2011
Location
Bratislava
ISBN
978-80-89186-77-8
Book
Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics
Pages from
247
Pages to
251
Pages count
5
BibTex
@inproceedings{BUT36694,
author="Michal {Procházka} and František {Krčma} and Radek {Přikryl}",
title="Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor",
booktitle="Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics",
year="2011",
pages="247--251",
address="Bratislava",
isbn="978-80-89186-77-8"
}