Detail publikace

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

PROCHÁZKA, M. KRČMA, F. PŘIKRYL, R.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.

Klíčová slova

Optical emission spectroscopy, organosilicons, thin film deposition, plasma diagnostics

Autoři

PROCHÁZKA, M.; KRČMA, F.; PŘIKRYL, R.

Rok RIV

2011

Vydáno

14. 1. 2011

Místo

Bratislava

ISBN

978-80-89186-77-8

Kniha

Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics

Strany od

247

Strany do

251

Strany počet

BibTex

@inproceedings{BUT36694,
  author="Michal {Procházka} and František {Krčma} and Radek {Přikryl}",
  title="Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor",
  booktitle="Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics",
  year="2011",
  pages="247--251",
  address="Bratislava",
  isbn="978-80-89186-77-8"
}