Publication detail

Basic diagnostics of glow discharge using tetravinylsilane monomer

STUDÝNKA, J., ČECH, V., PŘIKRYL, R.

Original Title

Type

conference paper

Language

English

Original Abstract

Plasma-Enhanced Chemical Vapor Deposition (PE CVD) is a suitable technique for preparation of thin films on a basis of organosilicones [1,2]. The technique enables reproducible deposition of plasma polymer films with desired physico-chemical properties [3] by changing the deposition conditions (power, monomer flow rate, pressure). Tetravinylsilane (TVS) was used as a monomer for deposition of pp-TVS films for the first time. The symmetric molecule was tested in order to observe an influence of deposition conditions on the vinyl content in pp-TVS films during our study. The helical coupling system [4] was applied to deposit single films using an RF glow discharge operated in pulsed mode. The plasma was monitored by mass spectroscopy and photodiode with respect to the duty cycle (0.001 - 0.5) and period (2 - 1000 ms) of pulsed regime, monomer flow rate (0.05 - 0.62 sccm), pressure (0.1 - 4.4 Pa), and effective power (0.05 - 25 W).

Keywords

plasma, glow discharge; mass spectroscopy

Authors

STUDÝNKA, J., ČECH, V., PŘIKRYL, R.

RIV year

2005

Released

20. 9. 2005

Location

Brno

Pages from

Pages to

Pages count

BibTex

@inproceedings{BUT16051,
  author="Jan {Studýnka} and Radek {Přikryl} and Vladimír {Čech}",
  title="Basic diagnostics of glow discharge using tetravinylsilane monomer",
  booktitle="Juniormat 05",
  year="2005",
  pages="1--4",
  address="Brno"
}