Detail publikace

Basic diagnostics of glow discharge using tetravinylsilane monomer

STUDÝNKA, J., ČECH, V., PŘIKRYL, R.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Plasma-Enhanced Chemical Vapor Deposition (PE CVD) is a suitable technique for preparation of thin films on a basis of organosilicones [1,2]. The technique enables reproducible deposition of plasma polymer films with desired physico-chemical properties [3] by changing the deposition conditions (power, monomer flow rate, pressure). Tetravinylsilane (TVS) was used as a monomer for deposition of pp-TVS films for the first time. The symmetric molecule was tested in order to observe an influence of deposition conditions on the vinyl content in pp-TVS films during our study. The helical coupling system [4] was applied to deposit single films using an RF glow discharge operated in pulsed mode. The plasma was monitored by mass spectroscopy and photodiode with respect to the duty cycle (0.001 - 0.5) and period (2 - 1000 ms) of pulsed regime, monomer flow rate (0.05 - 0.62 sccm), pressure (0.1 - 4.4 Pa), and effective power (0.05 - 25 W).

Klíčová slova

plasma, glow discharge; mass spectroscopy

Autoři

STUDÝNKA, J., ČECH, V., PŘIKRYL, R.

Rok RIV

2005

Vydáno

20. 9. 2005

Místo

Brno

Strany od

Strany do

Strany počet

BibTex

@inproceedings{BUT16051,
  author="Jan {Studýnka} and Radek {Přikryl} and Vladimír {Čech}",
  title="Basic diagnostics of glow discharge using tetravinylsilane monomer",
  booktitle="Juniormat 05",
  year="2005",
  pages="1--4",
  address="Brno"
}