Publication detail
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.
Original Title
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
Type
abstract
Language
English
Original Abstract
This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.
Keywords
PECVD, fluorocarbon thin films, plasma diagnostics
Authors
BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.
Released
28. 4. 2013
Publisher
Eindhoven University
Location
Eindhoven
Pages from
P1-2
Pages to
P1-2
Pages count
1