Detail publikace
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.
Originální název
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
Typ
abstrakt
Jazyk
angličtina
Originální abstrakt
This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.
Klíčová slova
PECVD, fluorocarbon thin films, plasma diagnostics
Autoři
BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.
Vydáno
28. 4. 2013
Nakladatel
Eindhoven University
Místo
Eindhoven
Strany od
P1-2
Strany do
P1-2
Strany počet
1