Publication detail

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.

Original Title

Type

conference paper

Language

English

Original Abstract

This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Keywords

Thin film deposition, optical emission spectroscopy, oxygen transmission rate

Authors

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

RIV year

2012

Released

7. 12. 2012

Publisher

FCH VUT

Location

Brno

ISBN

978-80-214-4644-1

Book

Studentská odborná konference Chemie je život 2012, Sborník příspěvků

Pages from

405

Pages to

408

Pages count

BibTex

@inproceedings{BUT101783,
  author="Michal {Procházka} and Lucie {Janů} and František {Krčma} and Radek {Přikryl}",
  title="Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process",
  booktitle="Studentská odborná konference Chemie je život 2012, Sborník příspěvků",
  year="2012",
  pages="405--408",
  publisher="FCH VUT",
  address="Brno",
  isbn="978-80-214-4644-1"
}