Course detail
Physics and chemics of plasma
FCH-DCO_FNDAcad. year: 2025/2026
Selected chapters from physics and chemistry of equilibrium and non-equilibrium plasmas, their diagnostics and advanced applications with respect to the student's disertation theses.
Language of instruction
Czech
Mode of study
Not applicable.
Guarantor
Entry knowledge
Physical chemistry - thermodynamics, kinetics.
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations
Rules for evaluation and completion of the course
Student will give a presentation about given diagnostic technique (techniquies) for about 30 minutes. After that broad discussion for about next 30 minutes will be given.
Students must participate at exams of their colleagues.
Students must participate at exams of their colleagues.
Aims
The lectures give an overview through the fundamental properties of plasma state and presents methodology of plasma chemistry so that students of chemical engineering can apply the unique physical characteristics of plasma to such fields as material sciences, microelectronics, biology, and polymer, organic, inorganic and analytical chemistries. In the lecture is represented a broad spectrum of applications that give special attention to those in which a nonequilibrium plasma (Te >> Tn) is used.
Student will obtain detail knowledge about properties of plasma state and contemporary methodology of plasma chemistry related to his/her disertation thesis. The broader overview will be checked during the final exam.
Student will obtain detail knowledge about properties of plasma state and contemporary methodology of plasma chemistry related to his/her disertation thesis. The broader overview will be checked during the final exam.
Study aids
Not applicable.
Prerequisites and corequisites
Not applicable.
Basic literature
ANDERS, A. Handbook of Plasma Ion Implantation and deposition, 1st ed., New York: John Wiley & Sons, 2000, ISBN 0-471-24698-0 (CS)
ROTH J.R. Industrial Plasma Engineering I. , II., London: CRC Press - Taylor & Francis Group, 1995, ISBN (Vol. 1): 978-0750303187, ISBN (Vol. 2): 978-0750303170 (CS)
SHUL, R.J., PEARTON, S.J. Handbook of Advanced Plasma Processing, 1st ed., Berlin: Springer, 2000, ISBN 978-3-642-56989-0 (CS)
ROTH J.R. Industrial Plasma Engineering I. , II., London: CRC Press - Taylor & Francis Group, 1995, ISBN (Vol. 1): 978-0750303187, ISBN (Vol. 2): 978-0750303170 (CS)
SHUL, R.J., PEARTON, S.J. Handbook of Advanced Plasma Processing, 1st ed., Berlin: Springer, 2000, ISBN 978-3-642-56989-0 (CS)
Recommended reading
Not applicable.
Classification of course in study plans
- Programme DPCP_FCH_N Doctoral 1 year of study, winter semester, compulsory-optional
- Programme DKCP_FCH_N Doctoral 1 year of study, winter semester, compulsory-optional