Course detail

Photochemistry

FCH-DCO_NADAcad. year: 2025/2026

Sources of photochemically acive radiation, radiant flux measurement, Negative photoresists: photochemical processes by photoinduced crosslinking, Physical chemistry of crosslinking, Gel-point and resist sensitivity. Quantum yield of crosslinking. Photoinitiated polymerization. Radical generation, photofragmentation, hydrogen abstraction, photoinitiated cationic polymerization. Positive photoresists, photochemical transformation of diazonaphtochinons. Positive photoresists for UV-B region. Photoresist sensitometry.

Language of instruction

Czech

Mode of study

Not applicable.

Guarantor

prof. Ing. Michal Veselý, CSc.

Department

Institute of Physical and Applied Chemistry (ÚFSCH)

Entry knowledge

Photochemistry, physical chemistry

Rules for evaluation and completion of the course

Oral exam
none

Aims

The aim of this course is to provide students with advanced photochemical technologies.
Advanced knowledge of photochemistry and photophysics, photochemical reactions of organic and macromolecular compounds, polymer imaging systems and photopolymerizable systems and their use.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

REISER, A. Photoreactive Polymers: The Science and Technology of Resists. (EN)
ŠÍMA, J., ČEPPAN, M., JANČOVIČOVÁ, V., VELIČ, D. Fotochémia. 1. vyd. STU Bratislava, 2011 (SK)