Course detail
Thin Films
FCH-MC_TVRAcad. year: 2024/2025
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Language of instruction
Number of ECTS credits
Mode of study
Guarantor
Department
Entry knowledge
Rules for evaluation and completion of the course
Participation at lectures is not mandatory.
Aims
Students acquire basic knowledge about thin-film technology, characterization and application. They can use this knowledge in their diploma thesis and later as technologists and researchers.
Study aids
Prerequisites and corequisites
Basic literature
L. Eckertová, Fyzika tenkých vrstev, SNTL 1973 (CS)
M. Ohring, Materials Science of Thin Films, Academic Press 2002 (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004 (CS)
Recommended reading
Elearning
Classification of course in study plans
Type of course unit
Lecture
Teacher / Lecturer
Syllabus
2. Fundamentals of vacuum science
3. Introduction to plasma physics and chemistry
4. Physical vapor deposition
5. Chemical vapor deposition
6. Plasma-enhanced chemical vapor deposition
7. Film growth
8. Film thickness measurement
9. Scanning probe microscopy
10. Mechanical properties
11. Case study
12. Case study
13. Written test, visit to laboratories
Guided consultation in combined form of studies
Teacher / Lecturer
Elearning