Course detail
Preparation and Properties of Thin Layers of Materials
FCH-DA_PTVAcad. year: 2023/2024
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).
Language of instruction
Number of ECTS credits
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Department
Entry knowledge
Rules for evaluation and completion of the course
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Prerequisites and corequisites
Basic literature
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
Recommended reading
Classification of course in study plans
- Programme DKAP_CHM_4_N Doctoral, 1. year of study, winter semester, compulsory-optional
- Programme DPAP_CHM_4_N Doctoral, 1. year of study, winter semester, compulsory-optional