Course detail
Thin Films
FCH-BAO_TPVAcad. year: 2023/2024
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Language of instruction
Number of ECTS credits
Mode of study
Guarantor
Department
Offered to foreign students
Entry knowledge
Rules for evaluation and completion of the course
Optional attendance at lectures.
Aims
Students acquire basic knowledge about thin-film technology, characterization and application. They can use this knowledge in their diploma thesis and later as technologists and researchers.
Study aids
Prerequisites and corequisites
Basic literature
M. Ohring, Materials Science of Thin Films, Academic Press 2002 (EN)
N. Inagaki, Plasma Surface Modification and Plasma Polymerisation. Lancaster: Technomic Publ., 1996 (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004 (EN)
Recommended reading
Elearning
Classification of course in study plans
- Programme NPAP_ENVI Master's 1 year of study, summer semester, elective
Type of course unit
Lecture
Teacher / Lecturer
Syllabus
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Case study
Elearning