Course detail
Preparation and Properties of Thin Layers of Materials
FCH-DA_PTVAcad. year: 2022/2023
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).
Language of instruction
Mode of study
Guarantor
Department
Learning outcomes of the course unit
Prerequisites
Co-requisites
Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Mass spectrometry
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Spectroscopic ellipsometry
X-ray photoelectron spectroscopy (XPS)
Rutherford Backscattering Spectrometry (RBS):
Elastic Recoil Detection Analysis (ERDA):
Fourier Transform Infrared Spectroscopy (FTIR):
Case study
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
Recommended optional programme components
Prerequisites and corequisites
Basic literature
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)
Recommended reading
Elearning
Classification of course in study plans
- Programme DPAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional
- Programme DKAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional
Elearning