Course detail

Physics and chemics of plasma

FCH-DCO_FNDAcad. year: 2020/2021

Selected chapters from physics and chemistry of equilibrium and non-equilibrium plasmas, their diagnostics and advanced applications with respect to the student's disertation theses.

Language of instruction

Czech

Mode of study

Not applicable.

Guarantor

prof. RNDr. František Krčma, Ph.D.

Department

Institute of Physical and Applied Chemistry (ÚFSCH)

Learning outcomes of the course unit

Student will obtain detail knowledge about properties of plasma state and contemporary methodology of plasma chemistry related to his/her disertation thesis. The broader overview will be checked during the final exam.

Prerequisites

Physical chemistry - thermodynamics, kinetics.
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

Student will give a presentation about given diagnostic technique (techniquies) for about 30 minutes. After that broad discussion for about next 30 minutes will be given.

Course curriculum

Selected chapters from phzsics and chemistry of plasmas related to the student's theses:
Plasma thermodynamics and kinetics
Elementary phzsical and chemical processes in plasmas
Plasma diagnostics
Physical and chemical properties of plasmas
Laboratory plasmas of electrical discharges in gases and liquids
Advanced plasma chemical processes and technologies

Work placements

Not applicable.

Aims

The lectures give an overview through the fundamental properties of plasma state and presents methodology of plasma chemistry so that students of chemical engineering can apply the unique physical characteristics of plasma to such fields as material sciences, microelectronics, biology, and polymer, organic, inorganic and analytical chemistries. In the lecture is represented a broad spectrum of applications that give special attention to those in which a nonequilibrium plasma (Te >> Tn) is used.

Specification of controlled education, way of implementation and compensation for absences

Students must participate at exams of their colleagues.

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

ANDERS, A. Handbook of Plasma Ion Implantation and deposition, 1st ed., New York: John Wiley & Sons, 2000, ISBN 0-471-24698-0 (CS)
ROTH J.R. Industrial Plasma Engineering I. , II., London: CRC Press - Taylor & Francis Group, 1995, ISBN (Vol. 1): 978-0750303187, ISBN (Vol. 2): 978-0750303170 (CS)
SHUL, R.J., PEARTON, S.J. Handbook of Advanced Plasma Processing, 1st ed., Berlin: Springer, 2000, ISBN 978-3-642-56989-0 (CS)