Course detail

Thin Films

FCH-MCO_TVRAcad. year: 2012/2013

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).

Language of instruction

Czech

Number of ECTS credits

Mode of study

Not applicable.

Guarantor

prof. RNDr. Vladimír Čech, Ph.D.

Department

Institute of Materials Science (ÚCHM)

Learning outcomes of the course unit

Students acquire basic knowledge about thin-film technology, characterization and application.

Prerequisites

Elementary chemistry and physics.

Co-requisites

Not applicable.

Planned learning activities and teaching methods

Teaching methods depend on the type of course unit as specified in the article 7 of BUT Rules for Studies and Examinations.

Assesment methods and criteria linked to learning outcomes

Written test and oral exam.

Course curriculum

Introduction / References
Vacuum science
Plasma physics and plasma chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma polymerization
Film growth
Thin film characterization
Scanning probe microscopy
Machanical properties of thin films
Laboratory visit

Work placements

Not applicable.

Aims

Knowledge about advanced technologies and analyses of thin films is the aims of this subject.

Specification of controlled education, way of implementation and compensation for absences

Literature is recommended at the beginning of the semester. Knowledge about the subject is tested by written test and oral exam.

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

D.M. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998 (CS)
Eckertová L.: Fyzika tenkých vrstev. SNTL, Praha 1973. (CS)
Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998. (CS)
M. Ohring, The Materials Science of Thin Films, Academic Press 2001 (CS)
Mironov V. L.: Fundamentals of Scanning Probe Microscopy. Tekhnosfera, Moscow 2004. (CS)
N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic 1996 (CS)
Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002. (CS)

Type of course unit

Lecture

26 hod., optionally

Teacher / Lecturer

prof. RNDr. Vladimír Čech, Ph.D.

Guided consultation in combined form of studies

13 hod., optionally

Teacher / Lecturer

prof. RNDr. Vladimír Čech, Ph.D.