English

Not applicable.

Of all faculties

Fundamental properties of plasma state, principles of plasma generation and its diagnostics and present technology of plasma chemistry.

Physical chemistry - thermodynamics, kinetics.
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations

Not applicable.

Teaching methods depend on the type of course unit as specified in the article 7 of BUT Rules for Studies and Examinations.

Written examination.

1. Plasma definition
Thermodynamic equilibrium and disequilibrium plasma, non-isothermic plasma.
Debye diameter, plasma frequency.
Basic collision processes, cross section, collision frequency.

2. Plasma kinetic theory
Distribution functions.
Boltzmann kinetic equation and its solution, collision factor.
Maxwell distribution function.
Equation of continuity, Langevin equation.

3. Plasma properties
Inner and outer plasma parameters.
Electric conductivity, diffusion and ambipolar diffusion, temperature and concentration of charged particles in various kinds of plasma.
Dielectric plasma properties.
Plasma interaction with electromagnetic fields.

4.-5. Laboratory plasma
Conditions for ignition of various discharges (DC, RF, MW), Townsend´s theory of avalanche growth, Paschen law.
Electric discharges in gases (DC, RF, MW, corona, gliding, barrier, capacitive and inductive coupled discharges).
Electric discharges in liquids.

6.-7. Plasma diagnostics
Spectral and optical methods (electron, excitation, vibrational a rotational temperature), absorption spectroskopy of plasma (CRD, LIF, Raman scattering).
Probe methods (floating and plasma potential, simple and double Langmuir probe).
Corpuscular methods (mass spectrometry, actinometry).

8.-10. Plazmachemical processes
Kinetics of plazmachemical reactions, conditions for realization of plazmachemical reactions, rates of chemical reactions, reactions in non-equilibrium chemical kinetics.
Synthesis of organic compounds, plasma polymerization, deposition of organic layers, semipermeable membranes.
Plasma treatment of solid materials (polymers, textile, glass, semiconductors), change of adhesivity and wettability, surface oxidation reactions, grafting, change of molecular weight, ablation.
Plasma interaction with metals, plasma nitridation, PE CVD, PA CVD.
Plazmachemical treatment of natural materials.

11. Plazmachemical technologies
Sputtering (magnetron, diode, high frequency).
Plasma spraying, plasmatrons.
Plasma etching, electron beam.

12. Special kinds of plasma with participation of chemical reactions
Plasma in illumination techniques, chemical lasers, flat plasma displays.

Not applicable.

Fundamental properties of plasma state and present methodology of plasma chemistry are described in the lectures so that students of chemical engineering can apply the unique physical characteristics of plasma to fields such as material science, microelectronics, biology and polymer, organic, inorganic and analytical chemistry.

none

Not applicable.

Not applicable.

Chen F., Chang J. P.: Principles of Plasma Processing. Kluwer Academic, Plenum Publishers, NewYork 2003. (EN)

Roth J. R.: Industrial Plasma Engineering Volume 1: Principles. Institute of Physics Publishing, Bristol and Philadelphia 1995. (EN)
Roth J. R.: Industrial Plasma Engineering Volume 2: Applications to Nonthermal Plasma Processing. Institute of Physics Publishing, Bristol and Philadelphia 2001. (EN)