Publication detail

The influence of various deposition techniques on the photoelectrochemical properties of the titanium dioxide thin film

MOROZOVA, M. KLUSON, P. DZIK, P. VESELY, M. BAUDYS, M. KRYSA, J. SOLCOVA O.

Original Title

The influence of various deposition techniques on the photoelectrochemical properties of the titanium dioxide thin film

Type

journal article - other

Language

English

Original Abstract

Thin sol–gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as photoanode in the three-compartment electrochemical cell. The thin TiO2 films were treated at 450 C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV–Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation.

Keywords

Titanium dioxide, Dip-coating, Inkjet printing, Spray-coating, Photo-electrochemical properties

Authors

MOROZOVA, M.; KLUSON, P.; DZIK, P.; VESELY, M.; BAUDYS, M.; KRYSA, J.; SOLCOVA O.

RIV year

2013

Released

12. 1. 2013

Publisher

Springer Science+Business Media

Location

New York, USA

ISBN

0928-0707

Periodical

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY

Year of study

65

Number

3

State

United States of America

Pages from

452

Pages to

458

Pages count

7

URL

http://link.springer.com/article/10.1007%2Fs10971-012-2957-6

BibTex

@article{BUT99002,
  author="MOROZOVA, M. and KLUSON, P. and DZIK, P. and VESELY, M. and BAUDYS, M. and KRYSA, J. and SOLCOVA O.",
  title="The influence of various deposition techniques on the photoelectrochemical properties of the titanium dioxide thin film",
  journal="JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY",
  year="2013",
  volume="65",
  number="3",
  pages="452--458",
  doi="10.1007/s10971-012-2957-6",
  issn="0928-0707",
  url="http://link.springer.com/article/10.1007%2Fs10971-012-2957-6"
}