Publication detail

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

ČECH, V.

Original Title

Type

conference paper

Language

English

Original Abstract

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Keywords

thin films, PECVD, fiber-reinforced composites

Authors

ČECH, V.

Released

17. 12. 2012

Pages from

Pages to

Pages count

BibTex

@inproceedings{BUT97134,
  author="Vladimír {Čech}",
  title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys",
  booktitle="Proceedings 7th Asia-Pacific Int. Symp. Basics Appl. Plasma Technology (APSPT-7)",
  year="2012",
  pages="1--4"
}