Tailor-made plasma-polymerized tetravinylsilane

conference paper

English

Plasma polymer films of tetravinylsilane were deposited on silicon wafers using an RF glow discharge at a range of RF power (10-70 W). Spectroscopic techniques revealed that physico-chemical properties of plasma polymer depend on the RF power used if the flow rate was constant. An organic/inorganic character (C/Si ratio) of films and a content of vinyl groups could be controlled by the RF power. The refractive index of films increased with power from 1.7 (10 W) to 2.1 (70 W) at a wavelength of 633 nm and the extinction coefficient rose sharply with the power 0.18 (10 W)–0.30 (70 W) at a wavelength of 250 nm. The Youngs modulus and hardness of plasma polymer could be varied from 12 GPa (10 W) to 81 GPa (70 W) and from 0.84 to 8.8 GPa, respectively.

PECVD, tetravinylsilane, thin films

HOFEREK, L.; TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.

31. 12. 2011

1

4

4