Publication detail

UV-VIS Areal Reflectometry

SPOUSTA, J. URBÁNEK, M. NEUGEBAUER, P. ŠIKOLA, T. NAVRÁTIL, K.

Original Title

Type

presentation

Language

English

Original Abstract

Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 - 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.

Keywords

reflectometry; UV; SiO2

Authors

SPOUSTA, J.; URBÁNEK, M.; NEUGEBAUER, P.; ŠIKOLA, T.; NAVRÁTIL, K.

Released

25. 9. 2005

Location

Vienna

Pages from

111

Pages to

111

Pages count

BibTex

@misc{BUT63402,
  author="Jiří {Spousta} and Michal {Urbánek} and Petr {Neugebauer} and Tomáš {Šikola} and Karel {Navrátil}",
  title="UV-VIS Areal Reflectometry",
  year="2005",
  series="1",
  edition="1",
  pages="111--111",
  address="Vienna",
  note="presentation"
}