Publication detail

Plasma polymer films of tetravinylsilane modified by UV irradiation

ČECH, V. KONTÁROVÁ, S. TRIVEDI, R. PEŘINA, V. ZEMEK, J. MIKULÍK, P. CAHA, O.

Original Title

Type

abstract

Language

English

Original Abstract

As-deposited plasma polymer films of tetravinylsilane were modified by UV irradiation at ambient conditions. Surface and bulk spectroscopic techniques confirmed significant changes in chemical composition and structure that resulted in increased mechanical constants (Young's modulus, hardness) and density of the material due to the formation of a stronger polymer network with higher cross-linking. A decrease of the refractive index and extinction coefficient of the UV-irradiated material was caused by UV-induced chain scission and subsequent oxidation of the plasma polymer network. The surface morphology (RMS roughness) and wettability (surface free energy) of films can be controlled by UV exposition time. The most intensive aging effect was observed for the as-deposited film; in contrast, the 1000-min-UV-irradiated film appeared stable over 134 days. UV treatment can be characterized as an effective tool for additional tailoring of plasma polymer films according to their applications.

Keywords

Thin film; PECVD; tetravinylsilane; UV irradiation

Authors

ČECH, V.; KONTÁROVÁ, S.; TRIVEDI, R.; PEŘINA, V.; ZEMEK, J.; MIKULÍK, P.; CAHA, O.

Released

22. 12. 2009

Pages from

Pages to

Pages count

BibTex

@misc{BUT60919,
  author="Vladimír {Čech} and Soňa {Kontárová} and Rutul Rajendra {Trivedi} and Vratislav {Peřina} and Josef {Zemek} and Petr {Mikulík} and Ondřej {Caha}",
  title="Plasma polymer films of tetravinylsilane modified by UV irradiation",
  booktitle="Book of Abstracts, 7th AEPSE 2009, Busan",
  year="2009",
  pages="1--1",
  note="abstract"
}