Publication detail

Depth resolution enhancement by combined DSIMS and TOF-LEIS profiling

BÁBOR, P. DUDA, R. PRŮŠA, S. MATLOCHA, T. KOLÍBAL, M. ČECHAL, J. URBÁNEK, M. ŠIKOLA, T.

Original Title

Type

journal article - other

Language

English

Original Abstract

A combination of dynamic secondary ion mass spectroscopy (DSIMS) and time-of-flight low-energy ion scattering (TOF-LEIS) has been applied to acquire a composition depth profile of MoSi multilayers. During the sequential Ar+ sputtering secondary ions were monitored while in-between the sputtering cycles the TOF-LEIS spectra of scattered He neutrals were acquired. All the measured TOF-LEIS spectra versus sputtering time were displayed in one bitmap from which the depth profiles for different scattering depths were derived and analyzed. Analyzing the TOF-LEIS spectra of He particles scattered from the areas below the layer altered by ion-beam mixing led to an improvement of the depth resolution. In this way the resolution limits due to mixing phenomena can be overcome. Finally, the direct comparison of the DSIMS and TOF-LEIS depth profiles was carried out.

Keywords

DSIMS; TOF-LEIS; LEIS; Depth profiling; MoSi; HRTEM

Authors

BÁBOR, P.; DUDA, R.; PRŮŠA, S.; MATLOCHA, T.; KOLÍBAL, M.; ČECHAL, J.; URBÁNEK, M.; ŠIKOLA, T.

RIV year

2011

Released

1. 2. 2011

ISBN

0168-583X

Periodical

Nuclear Instruments and Methods in Physics Research B

Year of study

269

Number

State

Kingdom of the Netherlands

Pages from

369

Pages to

373

Pages count

BibTex

@article{BUT51013,
  author="Petr {Bábor} and Radek {Duda} and Stanislav {Průša} and Tomáš {Matlocha} and Miroslav {Kolíbal} and Jan {Čechal} and Michal {Urbánek} and Tomáš {Šikola}",
  title="Depth resolution enhancement by combined DSIMS and TOF-LEIS profiling",
  journal="Nuclear Instruments and Methods in Physics Research B",
  year="2011",
  volume="269",
  number="3",
  pages="369--373",
  issn="0168-583X"
}