Publication detail
Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers
CHOMOUCKÁ, J. DZIK, P. VESELÝ, M. DRBOHLAVOVÁ, J.
Original Title
Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers
Type
journal article - other
Language
English
Original Abstract
TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.
Keywords
photoctalytic degradation, formic acid
Authors
CHOMOUCKÁ, J.; DZIK, P.; VESELÝ, M.; DRBOHLAVOVÁ, J.
RIV year
2008
Released
9. 9. 2008
Publisher
ČSCH
Location
Praha
ISBN
1213-7103
Periodical
Chemické listy
Year of study
102
Number
15
State
Czech Republic
Pages from
s986
Pages to
s988
Pages count
3
URL