Publication detail

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

ČECH, V. STUDÝNKA, J. ČECHALOVÁ, B. MISTRÍK, J. ZEMEK, J.

Original Title

Type

journal article - other

Language

English

Original Abstract

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.

Keywords

Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization

Authors

ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.

RIV year

2008

Released

22. 12. 2008

ISBN

0257-8972

Periodical

Surface and Coatings Technology

Year of study

202

Number

State

Swiss Confederation

Pages from

5572

Pages to

5575

Pages count

BibTex

@article{BUT48292,
  author="Vladimír {Čech} and Jan {Studýnka} and Božena {Čechalová} and Jan {Mistrík} and Josef {Zemek}",
  title="Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD",
  journal="Surface and Coatings Technology",
  year="2008",
  volume="202",
  number="22",
  pages="5572--5575",
  issn="0257-8972"
}